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공동활용 연구장비

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플라즈마 원자층증착장비(ALD)

상담·문의하기

Remote Plasma Atomic Layer Deposition

  • 모델명 GS-ARCHE 1000P
  • 제조사 가소닉스
  • 장비용도 분석
  • 장비구분 기계가공/시험장비 > 반도체장비 > 원자층증착장비

상세정보

구축일자 2010-04-30
납품업체 가소닉스
위치 광주광역시 북구 첨단과기로 123 (오룡동) 1 광주과학기술원 삼성환경과학연구동 F2 212
구성및성능 Atomic layer deposition, ALD technique based on sequential self-terminating gas？solid reactions, has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range.
장비안내 Atomic layer deposition ALD technique based on sequential self-terminating gas？solid reactions has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range.

The growth of material layers by ALD consists of repeating the following characteristic four steps:

1. A self-terminating reaction of the first reactant A.
2. A purge or evacuation to remove the non-reacted reactants and the gaseous reaction by-products.
3. A self-terminating reaction of the second reactant B or another treatment to activate the surface again for the reaction of the first reactant.
4. A purge or evacuation.

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