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대학 인프라와 자원을 공유해 공동 연구와 기술 활용을 지원합니다.

공동활용 연구장비

장비사진

고성능 ICP플라즈마 식각장비

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Advanced ICP plasma etching system

  • 모델명 AMS 200
  • 제조사 Alcatel-lucent
  • 장비용도 생산
  • 장비구분 기계가공/시험장비 > 반도체장비 > 식각장비

상세정보

구축일자 2008-11-27
납품업체 Alcatel-lucent
위치 광주광역시 북구 첨단과기로 123 (오룡동) 1 광주과학기술원 다산빌딩 B1층 b02
구성및성능 GENMARK cassette loading robot + flat finder / aligner + UPS
+ laminar flow + automatic door
- 1 x wafer centering kit
- Source power supply: 3kW RF.
- Heated liner
- Bias power supply: 500W LF
- Lauda chiller type T2200
- Chamber Maglev Turbomolecular pump: Alcatel ATH 1600 MT
- DN 200 VAT pendulum valve control system series 65.1 + By-pass +
integrated cold trap directly connected to the outlet of ATH 1600 MT pump.
One handling system for cold trap is delivered with AMS 200 system.
- 3 x Type 1 gas lines with
fast response time Unit MFC's SF6/1000 C4F8/400 O2/400 sccm
- 1 x Type 1 gas line with Unit MFC's N2/1000 sccm Gas and
flow of 4 above gas lines type 1 should be confirmed by NNFC
- Special software capabilities dedicated to production system
. chuck auto clean function
. by product auto purging function
- Advantech industrial PC with CD-RW drive
- Windows operating interface
- Telediagnostic on PC and PLC (modem + software)
- End Point Detection viewport
- 1 x User's / maintenance manual on CD-ROM and PC hard disk
- 1 x Electrical schematics on clean room paper
- 1 x Electrical schematics on standard paper
- 1 x Components manual on CD-ROM
- Functional and process installation on site
- Cooling water(PCW): Input pressure: 5.5~6 bar
- Dry Nitrogen: Input pressure:
1) 1.5bar (+/-0.3bar) for Main system
2) 2bar ~ 7bar for ADP 122H
장비안내 Bosch process를 이용한 ICP 고성능 실리콘 건식 식각 장비
높은 종횡비를 갖는 실리콘 구조물 제작

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